Fourvac Technologies Successfully Develops Ion Assisted Electron Beam Deposition System

Fourvac Technologies proudly assembled a state-of-the-art Ion Assisted Electron Beam Deposition (IAD/IBAD) System, reinforcing our capabilities in delivering advanced thin-film vacuum deposition solutions for high-precision applications. Ion Assisted Deposition is an advanced Physical Vapor Deposition (PVD) technique in which a growing thin film is simultaneously bombarded with energetic ions during deposition. This process significantly improves coating adhesion, enhances film density, controls microstructure, and delivers superior stoichiometric precision making it ideal for high-performance optical, semiconductor, and research applications.